Extreme Ultraviolet Lithography Concept - EUV and EUVL - 3D Illustration

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  • Photo title: Extreme Ultraviolet Lithography Concept - EUV and EUVL - 3D Illustration
  • Author: Luisfilipemoreira
  • Cover photo description:
  • Extreme Ultraviolet Lithography Concept - EUV and EUVL - An EUV Laser Pulse Projecting Circuit Patterns onto a Silicon Wafer to Produce Next-Gen Microchips - 3D Illustration
  • Image ID:260911869
  • Views:0
  • Downloads:1

Keywords for Facebook, Twitter and LinkedIn timeline photos

039 beam chips circuit computers computing cpu devices electron electronic euv euvl extreme fabrication focused gpu illustration integrated ion iot laser law light lithography microchips microelectronics moore nanoimprint nanotechnology nextgeneration optical optics patterning performance photolithography photomask photoresist power processing production pulse resolution scanner shorter silicon system technology transistors ultraviolet wafer wavelength xray

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